PT. ERA MITRA PERDANA

PT. ERA MITRA PERDANA

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Thin Film Thickness

Thickness Measurement

Example Setup: Thin Film Thickness Measurement

Example setup: Thickness Measurement
Overview
A thin film on a substrate can act as an etalon, creating an interference pattern superimposed on the surface reflectivity when viewed in reflection. The spacing of the pattern’s sinusoidal peaks, when combined with the refractive index of the material, can be used to calculate the thickness of the material.Spectra observed in our operating software reveal oscillations caused by optical interference within the layers of the thin film substrate. Analysis of the wavelength position of the minima or maxima can determine either the thin film’s thickness (with the known refractive index of the film) or its refractive index (with the known film thickness). Keep in mind that the thickness of samples may not be uniform; we recommend measuring several locations on the film.

Thin Film Thickness Measurement System Components

HR2000+ES High-resolution spectrometer with enhanced sensitivity is configured with an extended-range grating (200-1050 nm), 10 µm slit and variable longpass filter and quartz window (DET2B-200-1100)
HL-2000
Tungsten halogen light source (360-2400 nm)
QP400-7-UV-VIS Premium-grade 400 µm diameter fiber optic reflection probe; 2 m length
Reflection probe fixture options RPH-1 holds 0.25” (6.35 mm) diameter probes at 45° and 90° to the surface STAGE Single-point Reflection Stage holds 0.25” (6.35 mm) diameter probes and accommodates substrates up 150 mm in diameter
Reference standard options STAN-SSH high-reflectivity specular reflectance standard STEP-WAFER options are Si-SiO2 reference wafers for thickness measurements of thin films on silicon wafers and other substrates
OceanView Spectroscopy operating software

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email : sales@eramitra.com


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PT. Era Mitra Perdana

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E-mail: sales@eramitra.co.id

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